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Acadlore takes over the publication of IJCMEM from 2025 Vol. 13, No. 3. The preceding volumes were published under a CC BY 4.0 license by the previous owner, and displayed here as agreed between Acadlore and the previous owner. ✯ : This issue/volume is not published by Acadlore.

Open Access
Research article

Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films

z.a. khan1,
p. pashaei2,
r.s. bajwa1,
m.h. nazir1,
m. cakmak2
1
Sustainable Design Research Center, Faculty of Science & Technology, Bournemouth University, UK.
2
Department of Physics, Gazi University Ankara, Turkey.
International Journal of Computational Methods and Experimental Measurements
|
Volume 3, Issue 2, 2015
|
Pages 165-174
Received: N/A,
Revised: N/A,
Accepted: N/A,
Available online: N/A
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Abstract:

The MnO–Zn thin films were fabricated by radio frequency (RF) magnetron sputtering and compared with pulse electrodeposition (PED) Zn thin films, doped with MnO and ZrO nanoparticles. Surface morphology, structural properties, chemical composition and corrosion resistance of these coatings were investigated by using scanning electron microscopy, X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy, 3-D scanning interferometry and environmental chamber. Surface morphology and degree of crystallinity have different behaviours for different deposition methods. Pulse-coated films have polycrystalline structure with high surface roughness (Ra), whereas sputtered films are monocrys­talline with reduced roughness (Ra). Corrosion tests of both RF sputter and PED films revealed that the distribution of corrosion products formed on the surface of sputter films were not severe in extent as in case of electrodeposited coatings. Results showed that the doping of ZrO nano-sized particles in Zn matrix and Mn–Zn composite films significantly improved the corrosion resistance of PED thin films.

Keywords: Corrosion resistance, electro-deposition, magnetron sputtering, surface analysis, thin films.


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GB-T-7714-2015
Khan, Z A, Pashaei, P., Bajwa, R.S., Nazir, M.H., & Cakmak, M. (2015). Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films. Int. J. Comput. Methods Exp. Meas., 3(2), 165-174. https://doi.org/10.2495/CMEM-V3-N2-165-174
Z.A. Khan, P. Pashaei, R.S. Bajwa, M.H. Nazir, and M. Cakmak, "Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films," Int. J. Comput. Methods Exp. Meas., vol. 3, no. 2, pp. 165-174, 2015. https://doi.org/10.2495/CMEM-V3-N2-165-174
@research-article{Khan2015FabricationAC,
title={Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films},
author={Z.A. Khan and P. Pashaei and R.S. Bajwa and M.H. Nazir and M. Cakmak},
journal={International Journal of Computational Methods and Experimental Measurements},
year={2015},
page={165-174},
doi={https://doi.org/10.2495/CMEM-V3-N2-165-174}
}
Z.A. Khan, et al. "Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films." International Journal of Computational Methods and Experimental Measurements, v 3, pp 165-174. doi: https://doi.org/10.2495/CMEM-V3-N2-165-174
Z.A. Khan, P. Pashaei, R.S. Bajwa, M.H. Nazir and M. Cakmak. "Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films." International Journal of Computational Methods and Experimental Measurements, 3, (2015): 165-174. doi: https://doi.org/10.2495/CMEM-V3-N2-165-174
KHAN Z A, PASHAEI P, BAJWA R S, et al. Fabrication And Characterization of Electrodeposited and Magnetron-Sputtered Thin Films[J]. International Journal of Computational Methods and Experimental Measurements, 2015, 3(2): 165-174. https://doi.org/10.2495/CMEM-V3-N2-165-174